ALD / High K Metal Precursors – Just Released!

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The High K / ALD Metal Precursors report provides information on the applications and markets associated with front end and back end of line precursors used to produce high dielectric constant (K) dielectrics and atomic layer deposition metal oxides and nitrides.

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Description

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1     Executive Summary

2     Scope

3     Definitions – Fundamentals of Dielectric Thin Film Deposition

3.1 Chemical Vapor Deposition – CVD

3.2      Atomic Layer Deposition – ALD

4    IC Technology Trends & Roadmaps

4.1      Memory Evolution

4.1. DRAM

4.1.2   State of the art 10nm class DRAM

4.1.3 Hybrid Memory Cube

4.1.4   2D- to 3D-NAND transition

4.2 Lithography – Multi-patterning and Hardmasks

4.3      Copper Interconnect

4.4     Logic Transistor Evolution

4.5      Extending FinFET to Horizonal Nanowires GAA FETs

4.6     Realizing vertical Logic Going vertical (2.5/3D)

5     WW Metal Precursor Market Size and CAGR

6    High-k/Metal Gate Logic & Memory Precursors

6.1      Application Description and Current Gate Materials

6.2      FEOL Logic Metal Precursor Overview

6.3      Future High-k/Metal Gate and Requirements

6.4     High-k capacitor precursor for Volatile & Non-Volatile Memory technologies

6.5      High-k Current Capacitor materials and precursors

6.6     High K Capacitor Market and Forecast

6.7      Long Term Metal Precursor Opportunities 3D-NAND

6.8     High-k / Metal Gate & Capacitor Market and Forecast

7     Interconnect

7.1      Interconnect Trends

7.2      Metal Plugs and Interconnect Materials CVD/ALD Metals Forecast

7.3      Alternative Barrier, Interconnect and Capping Materials

7.3.1 Atomic Layer Deposition Development for Barrier Films

7.3.2   Copper Cap after CMP

7.4      Interconnects at 7 nm and beyond

7.4.1 Cobalt Contacts and Interconnects

7.4.2   Ruthenium interconnects

8    Precursor Delivery and Monitoring

9    Market Segmentation & Shares

10       Future Outlook for High-k & Metal Precursors

10.1   ALD IP filing and global distribution of IP

10.2   High-k IP trends

11       Raw material supply chains

11.1   Zirconium and Hafnium

11.2   Niobium and Tantalum

11.3   Rare earth

11.4   Tungsten

11.5   Cobalt

11.5.1 Cobalt in lithium ion batteries

11.5.2 Sustainable Procurement Framework for Cobalt

12       Chemical Supplier Profiles

12.1   Supply Value Chain

12.2   Adeka

12.3   Air Liquide S.A

12.4   Azmax part of Azuma group

12.5   BASF

12.6   DNF “Dream New Future”

12.7   Dow Corning

12.8   Digital Speciality Chemicals (DSC)

12.9   Dow

12.10    Entegris (previously ATMI)

12.11    Epivalence

12.12    Fujifilm

12.13    Gelest, Inc

12.14    H.C. Starck

12.15    Kojundo Chemical Laboratory

12.16    Merck’s EMD Performance Materials (previously Epichem, SAFC Hitech

and AZ)

12.17    Nanmat Technology Co. Ltd.

12.18    Norquay Technology

12.19    Nova-Kem LLC

12.20    Nanogen Solutions

12.21    Pegasus

12.22    Praxair

12.23    Soulbrain Co., Ltd

12.24    STREM

12.25    TCI Chemicals

12.26    Tri Chemical Laboratories

12.27    Umicore

12.28    UP Chemical Co., Ltd

12.29   Versum Materials, Inc. (previously Air Products Chemical Inc.)

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